실리콘 기반 유·무기 하이브리드 나노라미네이트 연구 : 고성능 기능성 배리어 응용을 중심으로
Silicon-Based Organic/Inorganic Hybrid Nanolaminates for High-Performance Functional Barriers
- 주제(키워드) Graphene , Chemical Vapor Deposition , ALD , Encapsulation
- 주제(DDC) 620.11
- 발행기관 아주대학교 일반대학원
- 지도교수 김장환
- 발행년도 2026
- 학위수여년월 2026. 8
- 학위명 박사
- 학과 및 전공 일반대학원 신소재공학과
- 실제URI http://www.dcollection.net/handler/ajou/000000036560
- 본문언어 영어
- 저작권 아주대학교 논문은 저작권에 의해 보호받습니다.
초록/요약
This study investigates the application of single-crystal graphene, a two- dimensional （2D） material, as an encapsulation and protective film for various types of next-generation flexible organic light-emitting diodes （OLEDs）. Graphene possesses outstanding optical and mechanical properties; in particular, single-crystal graphene serves as an ideal barrier material that is entirely impermeable to gas molecules. By applying single-crystal graphene to OLEDs—which often suffer from device degradation due to out-gassing caused by residual gases and moisture within the thin films—this research contributes to the development of a robust encapsulation structure that effectively blocks both internal out-gassing and external moisture permeation. To achieve this, both mechanical exfoliation and chemical vapor deposition （CVD） approaches for thin-film encapsulation were explored. Mechanical exfoliation allows for the isolation of specific thicknesses from multilayered materials. Specifically, Layer-Engineered Exfoliation was utilized, which relies on the generation of defect-induced cracks through a film deposited on a multilayer thin film. By varying the type of deposited metal layer, the binding energy at the metal-graphene interface can be controlled, thereby regulating the crack propagation depth. Although this method enables precise control over the graphene thickness, it is limited by a relatively small scalable area. Conversely, the exfoliation process for CVD-synthesized graphene involves polymer coating followed by the wet etching of the catalytic metal. Because this approach minimizes both physical defects and contamination, research was conducted to integrate this transferred graphene with SiNx and SiOC nanolaminate structures. Furthermore, a continuous process sequence was designed to perform both atomic layer deposition （ALD） and CVD within a single vacuum chamber, establishing a foundational methodology for high-temperature CVD graphene synthesis. Finally, to achieve thin-film encapsulation with superior barrier properties using conventional equipment, this study integrates the graphene synthesis process with a supporting layer passivation method. This is accomplished by utilizing a water-soluble tungsten oxide （WO₃） layer to securely transfer the synthesized graphene, successfully securing a highly reliable barrier structure. Keywords: Graphene, Chemical Vapor Deposition, ALD, Encapsulation
more목차
Chapter 1 Introduction 1
Chapter 2 Research Background 5
2.1 Graphene and Two-Dimensional Materials Applicable to OLED 5
2.2 Necessity of Securing Large-Area Two-Dimensional Materials for OLED 17
Chapter 3 Research Trends 23
3.1 Various Graphene Synthesis Methods and Research Trend 23
3.2 Chemical Vapor Deposition （CVD） Method Trend 25
3.3 Layer Engineered Exfoliation （LEE） Method Trend 34
3.4 Review of Research Results on CVD and LEE Methods 37
Chapter 4 Experimental Methods 74
Chapter 5 Experimental Results and Discussion 82
Chapter 6 Conclusion 86
Reference 97
