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Workplace AI Resistance through Dual Technostress Appraisal : Evidence from Experimental and Response Surface Studies

목차

Ⅰ. Introduction 1
1.1. Overview 1
1.2. Overall research scope 5
1.3. Theoretical Foundations 5
1.3.1. Technostress: Eustress & Distress 6
1.3.2. Resistance intention 8
Ⅱ. Study 1: The Emergence of AI Resistance: A Dual Technostress Appraisal Experiment 10
2.1. Introduction 10
2.2 Theoretical Background 12
2.2.1 S-O-R framework 12
2.2.2 AI assistant and AI literacy 13
2.3 Research model and hypotheses 15
2.4 Method 19
2.4.1 Experimental design 19
2.4.2 Participants and procedure 22
2.5 Results 25
2.5.1 Manipulation check 25
2.5.2 Validity and reliability 26
2.5.3 Descriptive statistics 27
2.5.4 Test of mediating effects 29
2.5.5 Test of moderating effects 31
2.6 Discussion 34
2.6.1 Key findings 34
2.6.2 Implications 37
2.6.3 Limitations and future research 40
Ⅲ. Study 2: When Threat Outweighs Opportunity: A Response Surface Analysis of AI Resistance 42
3.1 Introduction 42
3.2 Theoretical Background 46
3.2.1 Workplace AI use and the transactional model of stress 46
3.3. Hypotheses Development 47
3.3.1 Independent effects of eustress and distress 48
3.3.2 Congruence effect: Balanced appraisal 49
3.3.3 Incongruence effect of eustress and distress 50
3.4 Methodology 52
3.4.1 Data collection 52
3.4.2 Measurement items 53
3.5 Data analysis 54
3.5.1 Validity & reliability analysis 54
3.5.2 Polynomial regression and response surface modeling 55
3.5.3 Hypotheses testing 57
3.6 Discussion 62
3.6.1 Key findings 62
3.6.2 Implications 64
3.6.3. Limitations and future research 66
Ⅳ. General Conclusion 67
References 71
Appendix A. 83
Appendix B. 84
초록 84

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